Tenders of Ihp Gmbh Leibniz Institut F R Innovative Mikroelektronik

Proof of the ability to post-process III-V coupon material

Germany – Industrial Clothing – Reinraumkleidung

67 Ghz Wafer Probes See performance description

Germany – Laboratory, Optical And Precision Equipments (excl. Glasses) – System Zur Herstellung Von Thermischen Cvd Nitrid-schichten Mittels Nh3 Und Dcs Und Zur Herstellung Von Oxid-schichten Mittels O2 Und Teos

Capacity increase transformer gas farm

Germany – Laboratory, Optical And Precision Equipments (excl. Glasses) – Ci/cd-system Für Ein Open-source-design-ökosystem

Support and development of the project proposal "german Chips Competence Center (g3c)"

Lot 09 - Earthing and lightning protection system

Extension of process gas supply Ve 01 473 process gases

A burner-washer system with a reactor and a washing section for the disposal of process gases from a plasma etching process is being advertised. Information about the process: - Process: Nitride/ Teos - Manufacturer: Asm - System: A400 Duo - Process chamber: 1x Nitride 2x Teos 1xbtbas - Pumps 2x Edwards Ixh1210 2x Edwards Ixh610 - N2 flushing per pump: 44slm