Tenders of I P Universitatea De Stat Din Moldova

Tenders of I P Universitatea De Stat Din Moldova

Moldova
Scanning Electronic Microscope With The Following Features: - Fully Computer Controlled Microscope With Tungsten Filament Or Equivalent, Both For High Vacuum And Low Vacuum Applications - High Vacuum Resolution: Min. 3nm At 30kv And Min. 8nm At 3kv - Resolution In Variable Pressure: 3.5nm At 30kv - Magnification Range From 3x Or Lower To Less Than 1,000,000x - Field Of View From Less Than 7mm At 10mm Working Distance - Beam Energy Range Of Electrons: From 200ev or lower to as low as 30kev - Sample current from 1pa or lower to as low as 2ua - The sample current is continuously adjustable from the software interface, without the need for any kind of mechanical intervention ( centering) to the Column Performed by the User. - It does not require an aperture system for the different imaging modes, or if they are needed, then they are heated to avoid their contamination - Software for real-time calculation of the size of the spot on the sample - Scanning speed of 20ns or less up to 10ms Per Pixel Adjustable in Steps and Continuously - High Vacuum Mode and Low Vacuum Mode up to 500pa - Sample Platen with Motorized Movement in the X Axis of 60mm, in the Y Axis of 60mm and Continuous Rotation 3600 - Displacement On the Z-axis of at least 50mm - Left-right inclination of at least 800 In each direction - Maximum Sample Height: At least 50mm - Detectors Included in Delivery: A. Secondary Electron Detector B. Picoammeter For Measuring Sample Current C. Alarm On Touch – Stops Movement If Any Touch Occurs In The Sample Camera - Maximum Image Size At Least 16k X 16k Pixels - Automations Such As: Continuous Adjustment Spot And Current Size, Focus, Astigmatism, Contrast-Glow, Filament Heating And Centering, Cannon Centering And Column Etc. - Software: Measurements, Image Processing Etc. - Includes PC with monitor, keyboard and mouse and ups Edx specific features: - X-ray detector without liquid nitrogen, resolution of 129ev or better, active area of ​​at least 30mm 2 - X-ray detector software: to allow elemental analysis on A Region, On A Point, On A Line And Mapping, Creating Analysis Reports. Ebl Specific Features: - Advanced Electron Lithography Software That Can Generate Geometric Shapes, Bitmap Images, Text, Alignment Marks - Minimum Dwell Time Per Pixel Of 20ns/pixel Or Less For Any Shape - Multiple Adjacent Write Fields (stitching) - Proximity Effect Correction - Import Files In Universal Gdsii And Dxf Formats - Electrostatic Beam Blanker Or Equivalent To Block The Electron Beam Between Individual Objects From The Structure To Be Written; The Electrostatic Beam Blanker Or Equivalent Could Also Be Used To Reduce The Effect Of Charging The Surface Of Non-conductive Samples In SEM Imaging By Reducing The Exposure Time Per Pixel - The Beam Blanker Will Contain An Electron Beam Blocking Device (e.g. Two Electrode Assembly) Connected To A Fast Amplifier: 10mhz Max. - Beam Locking Time: <=50ns Typical - Illumination Time: <=50ns Typical - Delay Time: <=80ns Typical - Additional Electromagnetic Beam Blanker (Using Sem Column Coils) Also Included So That By The Combination of the Electromagnetic Beam Blanker with the Electrostatic Beam Blanker to Avoid the Possibility of Electrons Reaching Areas Other Than Those of Interest - Special Support for Lithography Samples - The Beam Blanker Could Be Used for Intermittent Blocking of the Beam During Image Acquisition So as to Reduce Exposure of the sample to electron radiation thus minimizing the effect of electrostatic charging of the sample; - The microscope will automatically control the beam blanker so that the movement of the electron beam is synchronized with the beam blanker for

Closing Date

11 Apr 2024

Tender Amount

MDL 3.9 Million (USD 224.1 K)